Expertise in large area and low cost photonic and plasmonic structures via unconventional nanofabrication applied to emerging optoelectronic devices.
Field of interest
Nanostructured dielectric and metallic photonic architectures can concentrate the electric field through resonances, increase the light optical path by strong diffraction and exhibit many other interesting optical phenomena that cannot be achieved with traditional lenses and mirrors. The use of these structures within actual devices will be most beneficial for enhanced light absorption in thin solar cells, photodetectors and to develop new sensors and light emitters. However, emerging optoelectronic devices rely on large area and low cost fabrication routes such as roll to roll or solution processing, to cut manufacturing costs and increase the production throughput. If the exciting properties exhibited photonic structures are to be implemented in these devices then, they too have to be processed in a similar fashion as the devices they intend to improve.
Our approach combines soft nanolithography, transfer printing and industry compatible fabrication approaches to integrate the architectures as part of the optoelectronic devices.
- Optical Design: We are manage different calculation methodologies (FDTD, DDA, Transfer Matrix,…) for the design of the different photonic schemes.
- Nanofabrication: We possess a fully equipped chemical lab with a nanoimprinting set up that allows us to nanostructure a wide variety of materials within minutes and outside of the clean room. Our approach is to fabricate high quality photonic nanostructures over large areas in a scalable fashion.
- Optical Characterization: FTIR spectrometer attached to an optical microscope (Bruker, Vertex 70 + hyperion) operating in the range 400 nm– 24 mm; Super continuum laser (Fianium, 4W with dedicated monochromators); Pulsed 532 nm laser (1-100Hz, 1ns, 100mW), Integrated sphere set up, dichroism set up.