High resolution patterning in organic semiconductors
A new method for high resolution structural and/or compositional modification in a molecular organic semiconductor film. This method has applications in the production of electronic, optoelectronic and photoinc devices.
A key part of fabrication of organic semiconductor active layers involve spatial patterning of material characteristics to enable device-specific functionalities.
Our method consist on the solution deposition of a molecular gate interlayer onto the target semiconductor layer, followed by a donor layer comprising functional small molecules. Application of a stimulus such as laser light, activates diffusion of the functional molecules into the semiconductor layer through the molecular gate.