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High resolution patterning in organic semiconductors

A new method for high resolution structural and/or compositional modification in a molecular organic semiconductor film. This method has applications in the production of electronic, optoelectronic and photoinc devices.


A key part of fabrication of organic semiconductor active layers involve spatial patterning of material characteristics to enable device-specific functionalities.

Our method consist on the solution deposition of a molecular gate interlayer onto the target semiconductor layer, followed by a donor layer comprising functional small molecules. Application of a stimulus such as laser light, activates diffusion of the functional molecules into the semiconductor layer through the molecular gate.